WITec alpha300 Semiconductor Edition

Magnification Range

20x to 100x

Numerical Aperture (NA)

0.5 (20x), 0.9 (100x)

Resolution

~200 nm lateral; 0.1 cm⁻¹ spectral

Field of View (FOV)

Up to 300 x 350 mm; multiple µm² scan sizes

Depth of Field

~900 nm (100x objective)

Contrast Methods

Confocal Raman, PL, white-light

Optical System Type

Confocal Raman & PL microscope

Leica Microsystems DMi1

Magnification Range

Phase contrast at 10x, 20x, 40x

Numerical Aperture (NA)

Condensers: S40/0.45, S80/0.30; Objective NA not specified

Resolution

Not specified; described as delivering high clarity

Field of View (FOV)

FOV20 listed; exact size not specified

Depth of Field

Not specified

Contrast Methods

Phase Contrast, Brightfield

Optical System Type

Inverted; optical system type not specified

Zeiss MultiSEM

Magnification Range

Not specified

Numerical Aperture (NA)

Not applicable

Resolution

≤ 3.5 nm @ 1.0–3.0 kV

Field of View (FOV)

132–165 µm (hexagonal)

Depth of Field

Not specified

Contrast Methods

Multi-detector SE signal collection

Optical System Type

Multi-beam SEM, Schottky emitter