WITec alpha300 Semiconductor Edition

Magnification Range

20x to 100x

Numerical Aperture (NA)

0.5 (20x), 0.9 (100x)

Resolution

~200 nm lateral; 0.1 cm⁻¹ spectral

Field of View (FOV)

Up to 300 x 350 mm; multiple µm² scan sizes

Depth of Field

~900 nm (100x objective)

Contrast Methods

Confocal Raman, PL, white-light

Optical System Type

Confocal Raman & PL microscope

Leica Microsystems DMi1

Magnification Range

Phase contrast at 10x, 20x, 40x

Numerical Aperture (NA)

Condensers: S40/0.45, S80/0.30; Objective NA not specified

Resolution

Not specified; described as delivering high clarity

Field of View (FOV)

FOV20 listed; exact size not specified

Depth of Field

Not specified

Contrast Methods

Phase Contrast, Brightfield

Optical System Type

Inverted; optical system type not specified

Thermo Fisher Scientific Prisma E SEM

Magnification Range

Adjustable via MUI; exact range not specified

Numerical Aperture (NA)

Not applicable / Not specified

Resolution

3.0 nm @ 30 kV (HV/LV/ESEM), 7.0 nm @ 3 kV (BSED, decel)

Field of View (FOV)

Large; e.g., up to 40 mm (Nav-Cam); exact range not specified

Depth of Field

Not specified

Contrast Methods

SE, BSE, CL, STEM (BF, DF, HAADF), ChemiSEM, beam decel, vacuum modes

Optical System Type

Scanning Electron Microscope (SEM)

Zeiss MultiSEM

Magnification Range

Not specified

Numerical Aperture (NA)

Not applicable

Resolution

≤ 3.5 nm @ 1.0–3.0 kV

Field of View (FOV)

132–165 µm (hexagonal)

Depth of Field

Not specified

Contrast Methods

Multi-detector SE signal collection

Optical System Type

Multi-beam SEM, Schottky emitter